Atomic Layer Deposition (ALD): Basic Principles, Characterizations, and Applications 🗓

— AVS Short Course

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Registration Deadline March 13, 2018
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Webinar Date: March 15, 2018
Time: 1:00 – 5:00 PM (EDT)

Location: on the Web
Cost: $200
RSVP: Registration Deadline March 13, 2018
Event Details & Registration: AVS
Summary:
The Webinar focuses on Atomic Layer Deposition (ALD): Basic Principles, Characterizations, and Applications will be held on Thursday, March 15, 2018 from 1:00-5:00 p.m (EDT). This webinar will be taught by AVS Instructor, Robert K. Grubbs. Dr. Grubbs has been working in the semiconductor industry and in the area of national security. This webinar on ALD is for anyone who wants to know specific details about how the ALD process works and how to implement ALD in a laboratory setting. It will cover the basic aspects of the chemical mechanism of ALD and how that leads to the unique and potent properties of an ALD process. Multiple examples of ALD chemistry will be covered as well as reactor design, chemical precursor properties, plasma ALD, and molecular layer deposition (MLD).