Advanced Technology Enabling CubeSat and Flagship Missions đź—“

California Institute of Technology, Pasadena, Map

Meeting Date: November 21, 2019
Time: 5:30 PM
Speaker: Dr. April D. Jewell
Location: California Institute of Technology, Pasadena,
Cost: none
RSVP: requested, through website
Event Details: IEEE vTools

Significant advances in instrument technologies are enabling exciting new science in astrophysics, planetary science, and heliophysics. For example, JPL’s 2D-doping is a band structure engineering process that results in near- 100% internal quantum efficiency and ultrastability, and can be applied to virtually any silicon-based detector architecture. When paired with advanced UV coatings, 2D-doped detectors exhibit record performance. In this talk I will discuss these technologies and their application to the Star-Planet Activity Research CubeSat
(SPARCS), currently in development. SPARCS will be a 6U CubeSat whose
mission will be to observe M stars in two ultraviolet (UV) bands—SPARCS far UV
(S-FUV: 153-171 nm) and SPARCS near UV (S-NUV: 260-300 nm). SPARCS
would be the first mission to provide time-dependent spectral slope, intensity and
evolution of M dwarf stellar radiation; measurements that are critical to deciphering
observations of planetary atmosphere from missions such as JWST.

Dr. April D. Jewell is a member of the Technical Staff
in JPL’s Advanced Detectors, Systems and Nanoscience
Group. She has degrees from George Washington
University (BS, Chemistry) and Tufts University (PhD,
Chemistry). Her work is focused on post-fabrication
processing and optimization techniques for silicon-based
imagers with the goal of fine-tuning a detector’s
response for project- or mission-specific applications.
Dr. Jewell’s work is a combination of material science
and process development; she uses molecular beam
epitaxy (MBE) for surface band structure engineering and atomic layer deposition
(ALD) for nanometer-scale coatings and filters. Dr. Jewell’s surface science
background allows her to develop MBE and ALD processes that are general enough
that they can be applied to virtually any silicon-based imager. Dr. Jewell is a recent
recipient of SPIE’s Rising Researcher